Relaunched 2026
A curated, not-for-profit publishing platform. Advanced Materials Letters publishes by invitation — articles from IAAM Fellows, awardees and collaborating institutions — with reading access through IAAM membership and subscription. Authors are never charged a fee.
See the access model →
Back to Browse

Graphical Abstract & Abstract

A facile growth of carbon nanotubes (CNTs) was facilitated by the use of direct-current plating technique for catalyst preparation. Ni nanoparticles (NPs) were deposited on Cu foil at different applied voltages of 1.0, 1.5 and 2.0 V. The Ni-deposited foil was subsequently used as catalyst for CNTs synthesis by chemical vapour deposition (CVD) method. CVD was carried out at 800 ºC using ethanol as carbon source. A voltage of 1.5 V was the optimum condition to deposit uniform Ni NPs that had a narrow size distribution of 55±3 nm, which in turn, yielded synthesized CNTs with a uniform diameter of approximately 60±5 nm with graphitic layers parallel to the CNTs axis. On the other hand, electroplated Ni at 1.0 V produced CNTs with graphitic layers at an angle to the CNTs axis, while electroplated Ni at 2.0 V produced curly CNTs with a wide distribution of diameters. These results show that Ni NPs size distribution could be controlled by electroplated voltage. Our observation was that Ni NPs

How to Cite

(2015). Facile Growth Of Carbon Nanaotube Electrode From Electroplated Ni Catalyst For Supercapacitor. Advanced Materials Letters, 6(6), 501-504. https://doi.org/10.5185/amlett.2015.SMS6