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Graphical Abstract & Abstract

Scanning tunneling microscopy and X-ray photoelectron spectroscopy have been utilized to probe the growth kinetics, phenomenon of nucleation and segregation of Indium nano-islands on atomically clean stepped Si (113) 3x2 surface. Kinetically controlled growth of few monolayers (2.5 ML) of Indium (In) atoms at room temperature leads the formation of two dimensional (2D) nanoclusters on Si (113) surface. The thermal stability of these In nanoclusters was investigated by residual thermal desorption experiments where the In adsorbed system was annealed at different temperatures (100-600 o C). It is found that, the size and density of the In nanoclusters on Si surface were influenced by the annealing temperature. In particular, on annealing the In/Si (113) system at 300 °C, 2D nanoclusters were converted into a metastable state of 3D nanoclusters. Competition between layering and nano-clustering has been observed twice during the entire thermal annealing process and discussed in detail. The

How to Cite

(2015). Competition Between Layering & Nano-clustering Of Indium Atoms On Reconstructed Si (113) 3x2 Surface. Advanced Materials Letters, 6(8), 690-694. https://doi.org/10.5185/amlett.2015.5822