Structural, Corrosion And Mechanical Properties Of Sputtered Deposited Chromium Tungsten Nitride (Cr1-xWxN) Nanocomposite Thin Films

Chromium tungsten nitride (Cr1-xWxN) thin films were successfully deposited on the silicon (100) substrate using dc magnetron reactive co-sputtering. The structural, surface morphological, electrochemical and mechanical properties were studied using X-ray diffraction, field emission-scanning electron microscopy, atomic force microscopy, electrochemical potentiostat and nanoindentation respectively. X-ray diffraction pattern with different atomic concentrations of tungsten (0