Effect of deposition temperature on the electrochromic properties of WO3 grown by LPCVD

Monoclinic electrochromic tungsten trioxide (WO3) layers were grown on FTO substrates using a Low-Pressure Chemical Vapor Deposition (LPCVD) system. The effect of the deposition temperature on the structural and morphological characteristics as well as the electrochromic response of the layers was examined. It was found that increasing deposition temperature improves the crystallinity of the layers which affects their electrochemical/electrochromic behavior.