The effect of growth time and oxygen flow on the properties of electrochromic WO3 thin layers grown by LPCVD

Results are presented regarding the development of functional electrochromic WO3 thin layers, using a simple, one step and fast process without the need of template or seed layers or even post-annealing, factors favoring large scale industrial deposition. In particular, low-pressure chemical vapor deposition (LPCVD) was employed to develop gama-monoclinic WO3 crystalline phase of granular agglomerations structure, with a thickness from 60 nm up to 160 nm onto FTO coated glass substrates. The effect of growth time and oxygen flow on the structural, morphological and electrochemical properties of WO3 thin layers was investigated. It was found that a deposition time of 15min and an O2 flow rate through the reactor of 0.1 l/min result in a more stable behavior during the interchange charge circles.