Swift heavy ion induced modifications in the structural, optical and methane sensing properties of indium oxide thin films - A comparative study using Ag9+ and O7+ ion irradiation

Thin films of indium oxide grown on quartz substrates were subjected to 100 MeV Ag 9+ and O 7+ ions irradiation. The pristine and swift heavy ions irradiated films were characterized using X-ray Diffraction, Rutherford Backscattering Spectrometry, Scanning Electron Microscopy and UV-Vis Spectroscopy to examine the effect of irradiation with ions having large difference in the values of electronic energy loss (Se) on the structural, microstructural and optical properties of indium oxide thin films. XRD and SEM studies revealed deterioration in crystallinity along with decrease in both crystallite size and grain size upon irradiation with both Ag 9+ and O 7+ ions. However, the decrease in the crystallite size and grain size in comparison to the pristine film was more radical for irradiation with Ag 9+ ions. RBS spectra suggest that the electronic sputtering in the indium oxide films due to SHI irradiation is very less. AFM images illustrate the decrease in surface roughness from 29.8 nm